Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy
Research output: Contribution to journal › Article › Research › peer-review
Authors
Organisational units
External Organisational units
- Infineon Technologies AG Austria
- ESRF
- Kompetenzzentrum Automobil- und Industrieelektronik GmbH
- Erich Schmid Institute of Materials Science
Details
| Original language | English |
|---|---|
| Article number | 137576 |
| Journal | Thin solid films |
| Volume | 691 |
| DOIs | |
| Publication status | Published - 1 Dec 2019 |
