Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

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Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. / Saghaeian, F.; Keckes, J.; Woehlert, S. et al.
In: Thin solid films, Vol. 691, 137576, 01.12.2019.

Research output: Contribution to journal › Article › Research › peer-review

Harvard

Saghaeian, F, Keckes, J, Woehlert, S, Rosenthal, M, Reisinger, M & Todt, J 2019, 'Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy', Thin solid films, vol. 691, 137576. https://doi.org/10.1016/j.tsf.2019.137576

APA

Saghaeian, F., Keckes, J., Woehlert, S., Rosenthal, M., Reisinger, M., & Todt, J. (2019). Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. Thin solid films, 691, Article 137576. https://doi.org/10.1016/j.tsf.2019.137576

Vancouver

Saghaeian F, Keckes J, Woehlert S, Rosenthal M, Reisinger M, Todt J. Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. Thin solid films. 2019 Dec 1;691:137576. doi: 10.1016/j.tsf.2019.137576

Author

Saghaeian, F. ; Keckes, J. ; Woehlert, S. et al. / Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. In: Thin solid films. 2019 ; Vol. 691.

Bibtex - Download

@article{73e2be12f03c4419ad6c7819ec3add18,
title = "Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy",
keywords = "Internal stress, Residual stress, Thin film, Titanium tungsten, Diffusion barrier, X-ray nanodiffraction",
author = "F. Saghaeian and J. Keckes and S. Woehlert and M. Rosenthal and M. Reisinger and J. Todt",
year = "2019",
month = dec,
day = "1",
doi = "10.1016/j.tsf.2019.137576",
language = "English",
volume = "691",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

AU - Saghaeian, F.

AU - Keckes, J.

AU - Woehlert, S.

AU - Rosenthal, M.

AU - Reisinger, M.

AU - Todt, J.

PY - 2019/12/1

Y1 - 2019/12/1

KW - Internal stress

KW - Residual stress

KW - Thin film

KW - Titanium tungsten, Diffusion barrier

KW - X-ray nanodiffraction

UR - http://www.scopus.com/inward/record.url?scp=85073521309&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2019.137576

DO - 10.1016/j.tsf.2019.137576

M3 - Article

AN - SCOPUS:85073521309

VL - 691

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

M1 - 137576

ER -

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