Microstructural effects on the interfacial adhesion of nanometer- thick Cu films on glass substrates: Implications for microelectronic devices

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Microstructural effects on the interfacial adhesion of nanometer- thick Cu films on glass substrates: Implications for microelectronic devices. / Lassnig, A.; Terziyska, Velislava; Zalesak, Jakub et al.
In: ACS Applied Nano Materials, Vol. 2021, No. 4, 2021, p. 61-70.

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@article{cfb13d8e5c454299acc2ac1ffabbf3d5,
title = "Microstructural effects on the interfacial adhesion of nanometer- thick Cu films on glass substrates: Implications for microelectronic devices",
author = "A. Lassnig and Velislava Terziyska and Jakub Zalesak and Tanja J{\"o}rg and Daniel T{\"o}bbens and Thomas Griesser and Christian Mitterer and Reinhard Pippan and Megan Cordill",
year = "2021",
doi = "10.1021/acsanm.0c02182",
language = "English",
volume = "2021",
pages = "61--70",
journal = "ACS Applied Nano Materials",
issn = "2574-0970",
publisher = "American Chemical Society",
number = "4",

}

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TY - JOUR

T1 - Microstructural effects on the interfacial adhesion of nanometer- thick Cu films on glass substrates: Implications for microelectronic devices

AU - Lassnig, A.

AU - Terziyska, Velislava

AU - Zalesak, Jakub

AU - Jörg, Tanja

AU - Többens, Daniel

AU - Griesser, Thomas

AU - Mitterer, Christian

AU - Pippan, Reinhard

AU - Cordill, Megan

PY - 2021

Y1 - 2021

U2 - 10.1021/acsanm.0c02182

DO - 10.1021/acsanm.0c02182

M3 - Article

VL - 2021

SP - 61

EP - 70

JO - ACS Applied Nano Materials

JF - ACS Applied Nano Materials

SN - 2574-0970

IS - 4

ER -