Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

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Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects. / Angay, Firat; Löfler, Lukas; Tetard, Florent et al.
In: Journal of vacuum science & technology / A (JVST), Vol. 2020, 2020, p. 1-14.

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@article{9fd0e5f75f2b4236839134f8ea4a6c4a,
title = "Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects",
author = "Firat Angay and Lukas L{\"o}fler and Florent Tetard and Dominique Eyidi and Philippe Djemia and David Holec and Gregory Abadias",
year = "2020",
doi = "10.1116/6.0000292",
language = "English",
volume = "2020",
pages = "1--14",
journal = "Journal of vacuum science & technology / A (JVST)",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",

}

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TY - JOUR

T1 - Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

AU - Angay, Firat

AU - Löfler, Lukas

AU - Tetard, Florent

AU - Eyidi, Dominique

AU - Djemia, Philippe

AU - Holec, David

AU - Abadias, Gregory

PY - 2020

Y1 - 2020

U2 - 10.1116/6.0000292

DO - 10.1116/6.0000292

M3 - Article

VL - 2020

SP - 1

EP - 14

JO - Journal of vacuum science & technology / A (JVST)

JF - Journal of vacuum science & technology / A (JVST)

SN - 0734-2101

ER -