Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects
Research output: Contribution to journal › Article › Research › peer-review
Standard
In: Journal of vacuum science & technology / A (JVST), Vol. 2020, 2020, p. 1-14.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
APA
Vancouver
Author
Bibtex - Download
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects
AU - Angay, Firat
AU - Löfler, Lukas
AU - Tetard, Florent
AU - Eyidi, Dominique
AU - Djemia, Philippe
AU - Holec, David
AU - Abadias, Gregory
PY - 2020
Y1 - 2020
U2 - 10.1116/6.0000292
DO - 10.1116/6.0000292
M3 - Article
VL - 2020
SP - 1
EP - 14
JO - Journal of vacuum science & technology / A (JVST)
JF - Journal of vacuum science & technology / A (JVST)
SN - 0734-2101
ER -