Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Firat Angay
  • Florent Tetard
  • Dominique Eyidi
  • Philippe Djemia
  • Gregory Abadias

External Organisational units

  • Universite Paris 13-Sorbonne
  • CNRS-Université de Poitiers-ENSMA

Details

Original languageEnglish
Pages (from-to)1-14
JournalJournal of vacuum science & technology / A (JVST)
Volume2020
DOIs
Publication statusPublished - 2020