Influence of substrate stiffness and of PVD parameters on the microstructure and tension fracture characteristics of TiN thin films
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in: Procedia structural integrity / ESIS, Jahrgang 13, 2018, S. 658-663.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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TY - JOUR
T1 - Influence of substrate stiffness and of PVD parameters on the microstructure and tension fracture characteristics of TiN thin films
AU - da Silva, Felipe C
AU - Tunes, Matheus A
AU - Sagás, Julio C
AU - Schön, Cláudio G
PY - 2018
Y1 - 2018
U2 - 10.1016/j.prostr.2018.12.109
DO - 10.1016/j.prostr.2018.12.109
M3 - Article
VL - 13
SP - 658
EP - 663
JO - Procedia structural integrity / ESIS
JF - Procedia structural integrity / ESIS
SN - 2452-3216
ER -