Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction

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Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction. / Camara, Osmane; Tunes, Matheus A.; Greaves, Graeme et al.
In: Ultramicroscopy, Vol. 207, 112838, 01.12.2019.

Research output: Contribution to journalArticleResearchpeer-review

APA

Camara, O., Tunes, M. A., Greaves, G., Mir, A. H., Donnelly, S., & Hinks, J. A. (2019). Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction. Ultramicroscopy, 207, Article 112838. https://doi.org/10.1016/j.ultramic.2019.112838

Vancouver

Camara O, Tunes MA, Greaves G, Mir AH, Donnelly S, Hinks JA. Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction. Ultramicroscopy. 2019 Dec 1;207:112838. doi: 10.1016/j.ultramic.2019.112838

Author

Camara, Osmane ; Tunes, Matheus A. ; Greaves, Graeme et al. / Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction. In: Ultramicroscopy. 2019 ; Vol. 207.

Bibtex - Download

@article{9d14380253f040cc903f577e8947929e,
title = "Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction",
keywords = "Amorphization mechanisms, Displacement per atom, In-situ TEM, Radiation damage, Semiconductors",
author = "Osmane Camara and Tunes, {Matheus A.} and Graeme Greaves and Mir, {Anamul H.} and Stephen Donnelly and Hinks, {Jonathan A.}",
year = "2019",
month = dec,
day = "1",
doi = "10.1016/j.ultramic.2019.112838",
language = "English",
volume = "207",
journal = "Ultramicroscopy",
issn = "0304-3991",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Understanding amorphization mechanisms using ion irradiation in situ a TEM and 3D damage reconstruction

AU - Camara, Osmane

AU - Tunes, Matheus A.

AU - Greaves, Graeme

AU - Mir, Anamul H.

AU - Donnelly, Stephen

AU - Hinks, Jonathan A.

PY - 2019/12/1

Y1 - 2019/12/1

KW - Amorphization mechanisms

KW - Displacement per atom

KW - In-situ TEM

KW - Radiation damage

KW - Semiconductors

UR - http://www.scopus.com/inward/record.url?scp=85072723015&partnerID=8YFLogxK

U2 - 10.1016/j.ultramic.2019.112838

DO - 10.1016/j.ultramic.2019.112838

M3 - Article

C2 - 31585253

AN - SCOPUS:85072723015

VL - 207

JO - Ultramicroscopy

JF - Ultramicroscopy

SN - 0304-3991

M1 - 112838

ER -