Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition
Research output: Contribution to journal › Article › Research › peer-review
Standard
Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. / Pang, Jinbo; Mendes, R.G.; Wrobel, P.S. et al.
In: ACS nano, Vol. 11, No. 2, 01.2017, p. 1946-1956.
In: ACS nano, Vol. 11, No. 2, 01.2017, p. 1946-1956.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Pang, J, Mendes, RG, Wrobel, PS, Wlodarski, MD, Ta, HQ, Zhao, L, Giebeler, L, Trzebicka, B, Gemming, T, Fu, L, Liu, Z, Eckert, J, Bachmatiuk, A & Ruemmeli, MH 2017, 'Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition', ACS nano, vol. 11, no. 2, pp. 1946-1956.
APA
Pang, J., Mendes, R. G., Wrobel, P. S., Wlodarski, M. D., Ta, H. Q., Zhao, L., Giebeler, L., Trzebicka, B., Gemming, T., Fu, L., Liu, Z., Eckert, J., Bachmatiuk, A., & Ruemmeli, M. H. (2017). Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. ACS nano, 11(2), 1946-1956.
Vancouver
Pang J, Mendes RG, Wrobel PS, Wlodarski MD, Ta HQ, Zhao L et al. Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. ACS nano. 2017 Jan;11(2):1946-1956.
Author
Bibtex - Download
@article{c4edfd3e1149417790d69c8fc24cb6ac,
title = "Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition",
author = "Jinbo Pang and R.G. Mendes and P.S. Wrobel and M.D. Wlodarski and H.Q. Ta and Lei Zhao and Lars Giebeler and Barbara Trzebicka and Thomas Gemming and Lei Fu and Z. Liu and J{\"u}rgen Eckert and Alicja Bachmatiuk and M.H. Ruemmeli",
year = "2017",
month = jan,
language = "English",
volume = "11",
pages = "1946--1956",
journal = "ACS nano",
issn = "1936-0851",
publisher = "American Chemical Society",
number = "2",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition
AU - Pang, Jinbo
AU - Mendes, R.G.
AU - Wrobel, P.S.
AU - Wlodarski, M.D.
AU - Ta, H.Q.
AU - Zhao, Lei
AU - Giebeler, Lars
AU - Trzebicka, Barbara
AU - Gemming, Thomas
AU - Fu, Lei
AU - Liu, Z.
AU - Eckert, Jürgen
AU - Bachmatiuk, Alicja
AU - Ruemmeli, M.H.
PY - 2017/1
Y1 - 2017/1
M3 - Article
VL - 11
SP - 1946
EP - 1956
JO - ACS nano
JF - ACS nano
SN - 1936-0851
IS - 2
ER -
