Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth
Research output: Contribution to journal › Article › Research › peer-review
Standard
Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth. / Franz, Robert; Clavero, César; Anders, André et al.
In: Plasma sources science & technology (Plasma Sources Science and technology), Vol. 25, 2016, p. 1-11.
In: Plasma sources science & technology (Plasma Sources Science and technology), Vol. 25, 2016, p. 1-11.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Franz, R, Clavero, C, Anders, A & Kolbeck, J 2016, 'Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth', Plasma sources science & technology (Plasma Sources Science and technology), vol. 25, pp. 1-11. https://doi.org/10.1088/0963-0252/25/1/015022
APA
Franz, R., Clavero, C., Anders, A., & Kolbeck, J. (2016). Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth. Plasma sources science & technology (Plasma Sources Science and technology), 25, 1-11. https://doi.org/10.1088/0963-0252/25/1/015022
Vancouver
Franz R, Clavero C, Anders A, Kolbeck J. Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth. Plasma sources science & technology (Plasma Sources Science and technology). 2016;25:1-11. doi: 10.1088/0963-0252/25/1/015022
Author
Bibtex - Download
@article{6da37ff5e8e249f087f3ff3d9bf8002c,
title = "Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth",
author = "Robert Franz and C{\'e}sar Clavero and Andr{\'e} Anders and Jonathan Kolbeck",
year = "2016",
doi = "10.1088/0963-0252/25/1/015022",
language = "English",
volume = "25",
pages = "1--11",
journal = "Plasma sources science & technology (Plasma Sources Science and technology)",
issn = "0963-0252",
publisher = "IOP Publishing Ltd.",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth
AU - Franz, Robert
AU - Clavero, César
AU - Anders, André
AU - Kolbeck, Jonathan
PY - 2016
Y1 - 2016
U2 - 10.1088/0963-0252/25/1/015022
DO - 10.1088/0963-0252/25/1/015022
M3 - Article
VL - 25
SP - 1
EP - 11
JO - Plasma sources science & technology (Plasma Sources Science and technology)
JF - Plasma sources science & technology (Plasma Sources Science and technology)
SN - 0963-0252
ER -
