TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography

Research output: Contribution to journalArticleResearchpeer-review

Authors

External Organisational units

  • Materials Center Leoben Forschungs GmbH
  • Linköping University

Details

Original languageEnglish
Pages (from-to)1-8
Number of pages8
JournalJournal of Vacuum Science and Technology B, JVSTB
Volume34
Issue number2
DOIs
Publication statusPublished - 19 Feb 2016