Cu diffusion in single-crystal and polycrystalline TiN barrier layers: A high-resolution experimental study supported by first-principles calculations

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Anton S. Bochkarev
  • Bernhard Sartory
  • Livia Chitu
  • Maxim Popov
  • Peter Puschnig
  • Hong Ding
  • Jun Lu
  • Lars Hultman

External Organisational units

  • Materials Center Leoben Forschungs GmbH
  • Technische Universität Graz
  • Lawrence Berkeley National Laboratory
  • Linköping University

Details

Original languageEnglish
Pages (from-to)085307-1 - 085307-11
JournalJournal of applied physics
Volume118
Publication statusPublished - 2015